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公司简介:
研究所是“现代光学技术”教育部重点实验室、省重点实验室的组成单位;“光学工程”为省重点学科。主要从事微纳米结构制造技术、大口径衍射光学元件、宽幅幅面微米结构激光干涉光刻系统、新型显示与光导器件、微纳米压印技术与设备、全息投影屏、薄膜照明器件、激光转移材料、衍射光学仪器等领域的研制与产业化工作。 建有衍射光学实验室、光刻胶涂布实验室、离子刻蚀实验室、精密测量实验室、光刻实验室、微纳米压印实验室和数码激光干涉光刻设备研究实验室等。具有*的激光干涉光刻研究实验条件。曾获国家科技进步奖2等奖2项,江苏省科技进步1等奖1项,3等奖2项,全国“发明创业奖”1项,全军科技进步2等奖1项,江苏省十大优秀发明人 1项,全国留学回国人员成就奖1项等奖项。研究成员25名,硕博士学位人员占70%。陈林森研究员担任“中国光学学会全息与光信息处理专业委员会”主任。

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