Luwei Photoelectric

Luwei Photoelectric (stock code 688401) has been committed to the R&D, production, and sales of photomasks since its establishment. Its products are applied in industries such as flat panel display, semiconductors, touch control, and circuit boards, serving as the benchmark and blueprint for pattern transfer in downstream microelectronics manufacturing. Through years of technological accumulation and independent innovation, the company's production capacity can support all generation lines of flat panel display manufacturers and meet the application needs of advanced semiconductor chip packaging and devices. The company is a domestic photomask manufacturer capable of producing for G2.5-G11 full-generation lines, and its products can fully support panel production lines of different generations (G2.5-G11).
Based on the two core product lines of flat panel display photomasks and semiconductor photomasks, the company has gradually formed a development pattern of 'driving chips with screens.' Relying on continuous R&D investment, solid technical strength, reliable product quality, and high-quality services, the company has established long-term stable cooperative relationships with many well-known enterprises. Currently, the company has built two major production bases in Shenzhen and Chengdu, and also has a subsidiary in Hong Kong, a branch in Suzhou, and an office in Taiwan.
Adhering to the business philosophy of 'customer first, people-oriented, innovative thinking, and striving for excellence,' Luwei Photoelectric is committed to building a leading enterprise in the photomask industry, giving back to society with strength and sincerity.
After more than 20 years of development, Luwei Photoelectric has accumulated rich experience in photomask production and formed a complete R&D, production, and marketing system. It not only has a team of highly skilled professional technical talents but also has formed a relatively complete and comprehensive core technology system. Multiple technologies have formed patents, and some product technologies have broken foreign monopolies. In terms of G11 ultra-high generation photomasks, high-generation high-precision halftone photomasks, and photoresist coating products and technologies, the company has broken long-term foreign monopolies, which is of great significance for promoting the localization process of key materials in the flat panel display industry and semiconductor industry and achieving import substitution.
Relying on continuous R&D investment, solid technical strength, reliable product quality, and high-quality services, the company has established long-term stable cooperative relationships with many well-known enterprises. In the China New Display Industry Chain Awards co-organized by the China Electronic Materials Industry Association and the Liquid Crystal Branch of the China Optics and Optoelectronics Manufacturers Association, the company's G11 photomask product won the '2019 Outstanding Contribution Award,' and the halftone photomask product won the '2020 Development Contribution Award - Innovation Breakthrough Award.' In addition, the company has undertaken multiple scientific research projects such as technical transformation and technical research from national and provincial and municipal government departments. Among them, the 'Chengdu Luwei High-Generation Photomask Production Line Construction Project' was approved by the National Development and Reform Commission and the Ministry of Industry and Information Technology and included in the 2017 Electronic Information Industry Technical Transformation Special Project; in March 2020, the company passed the expert review of the Guangdong Provincial Department of Science and Technology and was recognized as the Guangdong Provincial Ultra-High Precision Laser Processing Photomask Engineering Technology Research Center.