Innova Photomask

Guangzhou Innova Photomask Technology Co., Ltd. was established in February 2021, located in the IC Industry Park of Sino-Singapore Knowledge City, Huangpu District, Guangzhou, Guangdong Province. It is an independent photomask manufacturer in China. The company focuses on the R&D and industrial production of high-end semiconductor photomasks, providing services such as photomask manufacturing, pellicle mounting, periodic quality inspection, photomask stripping, repair and cleaning, and lithography-related consulting.
Photomasks are essential base materials for the photolithography process, a key step in integrated circuit manufacturing. Laser projection efficiently and rapidly prints the photomask pattern onto silicon wafers, enabling the mass production of VLSI chips. The photomask serves as the master template for pattern replication in lithography, and its resolution directly determines the process level and performance of the chips.
The core team of Innova Photomask brings together multiple technical experts and management talents with over 20 years of experience in photomask manufacturing, ensuring the successful implementation of photomask manufacturing technology and aiming to resolve China's long-term dependence on imported photomask materials. In the future, the company will build a photomask manufacturing center in the Pearl River Delta, strongly supporting Guangdong Province to become the third pole of China's integrated circuit industry, and laying a solid foundation for the vigorous development of the nano-scale VLSI industry.